Cancer treatment not only damages tumour cells but also changes them. And some of these changes could be used to target treatment more effectively. Scientists from CEITEC Masaryk University and University Hospital Brno have found that during treatment for chronic lymphocytic leukaemia, a receptor becomes more abundant on the surface of cancer cells, making it possible to target them with an antibody. In laboratory experiments, the researchers therefore combined a commonly used drug with an antibody targeting this receptor. The combination killed leukaemia cells significantly more effectively than the drugs alone. The research is still at the preclinical stage, but points to a possible way towards more effective combination cancer therapies.Chronic lymphocytic leukaemia (CLL) is the most common leukaemia in older adults in the Western world. It affects white blood cells called B lymphocytes, which begin to multiply uncontrollably and accumulate in the blood, bone marrow and lymph nodes. CLL treatment has changed significantly in recent years. Modern targeted drugs can block signals that cancer cells need to survive and multiply.The researchers focused on what happens to leukaemia cells during such treatment. They analysed patient samples collected before and during treatment with BCR inhibitors, drugs commonly used to treat CLL. They studied patients receiving two different targeted BCR inhibitors. Although the two drugs affect cancer cells differently, the cells responded to both with surprisingly similar changes.<img src="https://storage.googleapis.com/labrulez-bucket-strapi-h3hsga3/CEITEC_Leukemicke_bunky_reaguji_na_lecbu_tak_ze_ze_sebe_udelaji_terc_2_8b86014944.jpeg" alt="CEITEC/Miroslav Boudný: Leukaemia Cells Respond to Treatment by Turning Themselves into a Target: Preparation of cells for experiments." srcset="https://storage.googleapis.com/labrulez-bucket-strapi-h3hsga3/thumbnail_CEITEC_Leukemicke_bunky_reaguji_na_lecbu_tak_ze_ze_sebe_udelaji_terc_2_8b86014944.jpeg 235w," sizes="100vw" width="1600" height="1067">“Cancer cells are not passive. They respond and adapt to treatment. We wanted to know whether, among the changes triggered by treatment, we could find something that could be used against them. That is what led us to the CXCR4 receptor,” explains <a target="_blank" rel="noopener noreferrer" href="https://www.ceitec.eu/veronika-sandova-ph-d/u95494?page=publication">Veronika Šandová</a>, a researcher&nbsp;from Marek Mraz’s laboratory at CEITEC Masaryk University and University Hospital Brno.CXCR4 is a receptor on the cell surface that, among other functions, helps leukaemia cells move to environments that provide favourable conditions for their survival. The researchers found that once treatment begins, CXCR4 levels on the surface of cancer cells increase significantly. The way cancer cells respond to treatment could therefore also become a weakness. Molecules on the cell surface are readily accessible to targeted treatment using specific antibodies.In laboratory experiments, the researchers therefore added ulocuplumab, an antibody that binds to the CXCR4 receptor, to the drugs already being used. The effect was substantial. While around seven out of ten leukaemia cells survived treatment with the drugs alone, only around three to four out of ten survived when the drugs were combined with the antibody. “It is a little like a cancer cell adapting against the first attack and, in doing so, marking itself as a target for a second one. The treatment increases the amount of a particular molecule on its surface, which we can then target,” Veronika Šandová explains.<img src="https://storage.googleapis.com/labrulez-bucket-strapi-h3hsga3/CEITEC_Leukemicke_bunky_reaguji_na_lecbu_tak_ze_ze_sebe_udelaji_terc_3_a3d50f3f82.jpeg" alt="CEITEC/Miroslav Boudný: Leukaemia Cells Respond to Treatment by Turning Themselves into a Target: Cooling the cells after the experiment prevents degradation of protein and other molecules." srcset="https://storage.googleapis.com/labrulez-bucket-strapi-h3hsga3/thumbnail_CEITEC_Leukemicke_bunky_reaguji_na_lecbu_tak_ze_ze_sebe_udelaji_terc_3_a3d50f3f82.jpeg 235w," sizes="100vw" width="1600" height="1067">The researchers went on to verify the results in a mouse model using leukaemia cells from patients. Here, too, the antibody targeting CXCR4 was highly effective at eliminating the cancer cells.The research is still at the preclinical stage, so this is not a new treatment that can yet be offered to patients. However, it suggests a possible way to identify more effective combinations of cancer drugs. “With cancer, targeting a single mechanism is often not enough because cancer cells can respond to treatment and find other ways to escape and survive. Our results show that we can use these changes to our advantage and target them with additional treatment,” says <a target="_blank" rel="noopener noreferrer" href="https://www.ceitec.eu/prof-marek-mraz-ph-d/u26692">Marek Mráz</a>, head of the research laboratory where the study was conducted.The study therefore offers another perspective on the search for new combinations of cancer treatments: looking not only at whether a drug kills a cancer cell, but also at how it changes the cell – and whether any of these changes could provide a new target for further treatment.The study was conducted in collaboration among scientists from CEITEC Masaryk University, University Hospital Brno, the Faculty of Medicine at Masaryk University, and the Dana-Farber Cancer Institute in Boston.The results were published in the scientific journal <a target="_blank" rel="noopener noreferrer" href="https://onlinelibrary.wiley.com/doi/10.1002/hem3.70481">HemaSphere</a>.<blockquote><h4>The original article</h4><h4><a target="_blank" rel="noopener noreferrer" href="https://onlinelibrary.wiley.com/doi/10.1002/hem3.70481">Gene expression analysis after BTK and PI3Kδ inhibitor treatment in chronic lymphocytic leukemia identifies cell-surface CXCR4 as a synergistic target for combinatorial therapy</a></h4>Gabriela Mladonicka Pavlasova, Veronika Sandova, Laura Ondrisova, Vaclav Seda, Petra Pavelkova, Daniel Filip, Krystof Hlavac, Josef Vecera, Sarka Pospisilova, Anna Panovska, Stacey M. Fernandes, Michael Doubek, Jennifer R. Brown, Marek MrazHemaSphere (2026) 10 (9): e70481<a target="_blank" rel="noopener noreferrer" href="https://doi.org/10.1002/hem3.70481">https://doi.org/10.1002/hem3.70481</a><h6>licensed under <a target="_blank" rel="noopener noreferrer" href="https://creativecommons.org/licenses/by/4.0/">CC-BY 4.0</a></h6></blockquote>Marek Mráz’s research group is part of the National Institute for Cancer Research (<a target="_blank" rel="noopener noreferrer" href="https://www.nuvr.cz/en/">NICR</a>).

Leukaemia Cells Respond to Treatment by Turning Themselves into a Target

News from LabRulezLCMS Library - Week 44, 2026

Our Library never stops expanding. What are the most recent contributions to LabRulezICPMS Library in the week of 26th October 2026? Check out new documents from the field of spectroscopy/spectrometry and related techniques!<blockquote>👉 <a target="_blank" rel="noopener noreferrer" href="https://icpms.labrulez.com/library">SEARCH THE LARGEST REPOSITORY OF DOCUMENTS ABOUT SPECTROSCOPY/SPECTROMETRY RELATED TECHNIQUES</a></blockquote><blockquote>👉 Need info about different analytical techniques? Peek into <a target="_blank" rel="noopener noreferrer" href="https://lcms.labrulez.com/library">LabRulezLCMS</a> or <a target="_blank" rel="noopener noreferrer" href="https://gcms.labrulez.com/library">LabRulezGCMS</a> libraries.</blockquote><h3>1. Agilent Technologies: Ultratrace Analysis of Surface Impurities in Photovoltaic-Grade Polysilicon by ICP-MS</h3>Quantification of 58 elements per GB/T24582-2023 using an <a target="_blank" rel="noopener noreferrer" href="https://labrulez.com/en-us/icpms/library?mainauthorItems=10&amp;search=8900">Agilent 8900 ICP-QQQ</a><ul><li>Application note</li><li><a target="_blank" rel="noopener noreferrer" href="https://labrulez.com/pdf/an_photovoltaic_cells_polysilicon_8900_icp_qqq_5995_0020en_agilent_2125536f4e.pdf">Full PDF for download</a>&nbsp;</li></ul>Green and sustainable energy reduces environmental harm, lowers carbon emissions, and supports long-term ecological balance.1 As energy demand rises and climate impacts intensify, transitioning from fossil fuels to renewable sources, such as solar, wind, hydro, geothermal, and biomass, has become essential for sustainability and energy security.2 Solar energy is widely used through technologies such as photovoltaic (PV) cells, which convert sunlight into electricity, and solar thermal systems, which produce heat. PV cells, which are typically made from crystalline silicon, are key to solar technology. The efficiency, cost, and durability of the cells largely depend on the materials used.3,4&nbsp;PV architectures are fundamentally built upon high-purity silicon ingots— a monocrystalline or polycrystalline mass of semiconductor-grade silicon, typically formed via the Czochralski or directional solidification process.5 These ingots are sliced into thin wafers that serve as the substrate for solar cell fabrication. In this process, doped regions and junctions are engineered to facilitate charge carrier separation and enable the conversion of incident solar radiation into electrical energy via the PV effect.6 Figure 1 depicts the manufacturing process for a PV panel.The <a target="_blank" rel="noopener noreferrer" href="https://labrulez.com/en-us/icpms/library?mainauthorItems=10&amp;search=8900">Agilent 8900 Triple Quadrupole ICP-MS (ICP-QQQ)</a> is an advanced analytical platform engineered for ultratrace elemental analysis in high-purity materials such as polysilicon used in PV manufacturing. Its unique tandem mass spectrometry (MS/MS) configuration—comprising two quadrupoles (Q1 and Q2) separated by a collision/reaction cell—enables exceptional control over ion selection and reaction chemistry. Q1 acts as a mass filter to isolate target precursor ions, allowing only specific m/z values into the cell, while Q2 analyzes product ions formed after controlled reactions with gases such as O2, H2, or NH3. This design effectively eliminates complex spectral interferences, including polyatomic and isobaric overlaps that are particularly problematic in high-silicon matrices. As a result, the 8900 achieves sub-parts-per-trillion (ppt) detection limits for critical impurities like alkali and alkaline earth elements that are otherwise difficult to quantify accurately using conventional ICP-MS. Also, its high sensitivity, wide dynamic range, and robust plasma conditions ensure reliable quantification across varying concentration levels. These capabilities make the 8900 ICP-QQQ a useful instrument for QC and contamination monitoring in the semiconductor and solar industries, where even trace impurities can significantly impact PV cell efficiency and performance.<h4>Conclusion&nbsp;</h4>An Agilent 8900 ICP‑QQQ, configured with an s‑lens ion optics system to enhance ion transmission efficiency and sensitivity, was used for the simultaneous quantification of 58 trace and ultratrace elements in two polycrystalline silicon ingot samples. Sample preparation was carried out by acid extraction in accordance with the GB/T 24582‑2023 standard.&nbsp;Ultratrace detection at sub‑ppt levels was achieved using MS/MS (triple quadrupole) mode, utilizing multiple reaction gases to systematically mitigate spectral interferences via mass‑shift and on‑mass reaction pathways. This approach enabled selective removal of polyatomic interferences commonly associated with silicon matrices, thereby improving analyte selectivity and lowering background noise. The method exhibited strong analytical precision, with relative standard deviations (RSDs) below 10% across six replicate measurements, indicating consistent signal stability, efficient interference control, and robust instrumental performance.&nbsp;The 0.1 µg/L spike‑recovery results within ± 20% confirmed the accuracy of the quantification. The internal standard recoveries verified stable instrument performance and effective correction for matrix‑induced signal variation, further supporting reliable multi‑element analysis of high‑purity silicon. This level of reliability is essential for maintaining accuracy at sub‑ppb levels in challenging silicon matrices.&nbsp;The 8900 ICP-QQQ method is well aligned with the demands of advanced manufacturing environments. It is particularly suited to PV production, where precise and reproducible impurity monitoring is vital for ensuring material quality, optimizing process control, and preserving device performance.<h3>2. LECO: Metallography of Aluminum and Aluminum Alloys</h3><ul><li>Application note</li><li><a target="_blank" rel="noopener noreferrer" href="https://labrulez.com/pdf/METALLOGRAPHY_ALUMINUM_ALUMINUM_ALLOY_203_821_722_c024278c37.pdf">Full PDF for download</a></li></ul>Aluminum has become a widely used material due to its natural corrosion resistance (oxide layer), manageable weight, high thermal conductivity, and cost-effective machinability. Pure Aluminum is too soft for structural use, so it is often alloyed with other metals such as Copper, Magnesium, Silicon, Zinc, and Manganese to increase its strength and durability for aerospace, automotive, and construction applications. Metallography is an important tool for verifying quality control properties in these materials, including grain size, intermetallic phases, precipitates, and porosity, all of which affect mechanical properties, corrosion resistance, and electrical conductivity. LECO offers complete metallographic solutions made to streamline and optimize every step of the sample preparation process from start to finish.<h4>Sample Sectioning&nbsp;</h4>With any metallographic sample, the most critical step of sample preparation is sectioning. The goal of sectioning is to remove a suitable-sized sample from a larger component with the least amount of deformation. If done incorrectly, thermal damage may occur to the sample's surface, requiring extra steps in the grinding/polishing phase. It could even affect the sample's microstructure, resulting in skewed image analysis results. In extreme cases, it may even require an operator to resection the sample, leading to additional costs and loss of valuable time. To increase efficiency, it is important to choose the correct blade and fixture for your sample.&nbsp;LECO recommends the use of a Silicon Carbide blade (SiC) for sectioning Aluminum alloys, as they are designed for soft non-ferrous metals, allowing minimal deformation and efficient heat dissipation. The SiC abrasives prevent smearing and tearing, outperforming harder Iron-focused blades on Aluminum structure. LECO offers a variety of fixturing options to accommodate even the most difficult geometries for sectioning (Figures 4 and 5). Fixturing the sample properly is critical to stabilize the sample to prevent unnecessary vibrations and release of the sample during the cutting process.&nbsp;If thermal degradation occurs after taking these necessary measures, it could be the sectioning method. Although chop cutting (Z-Axis) is the traditional form of operation with sectioning saws, it may be advantageous to try a pulse or planar cut that would provide more relief in the process. This could also be the case for an Aluminum part with complex geometry.<h4>Conclusion&nbsp;</h4>In summary, Aluminum and its alloys remain essential to modern engineering due to their lightweight nature, corrosion resistance, and adaptability. Ensuring these materials meet the demanding requirements of aerospace, automotive, and structural applications depends on precise metallographic evaluation. By characterizing grain structures, intermetallic phases, precipitates, and porosity, metallography provides critical insight into material performance, durability, and quality.&nbsp;LECO supports this process with a full suite of metallographic solutions designed to enhance efficiency and consistency at every stage of preparation. From robust sectioning systems that ensure clean, controlled cuts, to reliable mounting equipment that protects and preserves sample integrity, LECO enables repeatable, high-quality preparation. Our advanced grinding and polishing platforms deliver uniform, scratch-free surfaces ready for evaluation, while our comprehensive image analysis software provides accurate, data-driven characterization of microstructural features. Together, these tools offer a streamlined, end-to-end workflow that empowers laboratories to maintain stringent quality control and achieve confident, repeatable results.<h3>3. Shimadzu: Analysis of Trace and Major Elements in Steel by ICP-AES</h3><ul><li>Application note</li><li><a target="_blank" rel="noopener noreferrer" href="https://labrulez.com/pdf/an_01_01072_en_736a917a5f.pdf">Full PDF for download</a></li></ul><h5>User benefits</h5><ul><li>The ICPE-9820 enables analysis across a wide concentration range, from trace to major elements in steel.&nbsp;</li><li>Using a torch for high-salt samples and a water bubbler can suppress salt deposition when analyzing high-salt samples.&nbsp;</li><li>The use of a vacuum spectrometer enables rapid startup and quick analysis in the vacuum ultraviolet region (wavelengths below 190 nm).</li></ul>Steel materials are widely used in a diverse range of industries, including construction, transportation, and machinery manufacturing, and are indispensable in modern society. Steel contains various elements, and the types and concentrations of these elements significantly influence its properties. Accordingly, elemental analysis is essential for quality assurance and performance control.&nbsp;The elements in steel range from trace constituents to major components, with concentrations spanning a broad range from mg/L levels to percentage levels. Inductively coupled plasma atomic emission spectrometry (ICP-AES) is well suited to the analysis of elements across such a wide concentration range. It enables highly accurate quantitative analysis from trace elementsto major components.&nbsp;This Application News presents an analysis example of a stainless-steel certified reference material using the Shimadzu ICPE-9820 multi-type ICP atomic emission spectrometer.<h4>Analysis Conditions&nbsp;</h4>The <a target="_blank" rel="noopener noreferrer" href="https://labrulez.com/en-us/icpms/library?mainauthorItems=1&amp;search=ICPE-9820">ICPE-9820</a> enables simultaneous analysis using two view orientations: axial view (AX), which offers higher sensitivity, and radial view (RD), which is suitable for high-concentration analysis.&nbsp;For major element analysis, quantification was performed using the calibration curve method with the internal standard method. For trace element analysis, quantification was performed using the standard addition method.<h4>Conclusion&nbsp;</h4>In this Application News, trace and major elements in a stainless-steel certified reference material were analyzed using the ICPE-9820. The measured values showed good agreement with the certified values.&nbsp;The sample introduction system, consisting of a torch for highconcentration salt solution samples and a water bubbler, effectively prevented sensitivity loss from salt deposition. At the same time, the use of a Twister spray chamber enabled finer particle-size selection, thereby improving analytical accuracy for high-salt samples.&nbsp;In addition, the ICPE-9820 employs a vacuum spectrometer, enabling rapid startup and fast analysis in the vacuum ultraviolet region (wavelengths below 190 nm).<h3>4. Thermo Fisher Scientific: Rapid, accurate field analysis of phosphate ores with handheld XRF</h3><ul><li>Application note</li><li><a target="_blank" rel="noopener noreferrer" href="https://labrulez.com/pdf/field_analysis_of_phosphate_ores_an1912_en_b0cb5ab9ec.pdf">Full PDF for download</a></li></ul><h5>The need for rapid phosphate ore analysis&nbsp;</h5>Phosphate rock (phosphorite) is the primary source of phosphorus used in fertilizers, making it indispensable to global food production. As high-grade phosphorite deposits become increasingly depleted, mining operations must process lower-grade and more compositionally variable phosphate ores. This trend places greater emphasis on rapid, accurate elemental analysis to support exploration, grade control, process optimization, and compliance with environmental regulations. Handheld X-ray fluorescence (HHXRF) has become a key analytical tool for these applications by providing fast, non-destructive, multi-element analysis directly in the field or at the production site.<h5>Handheld XRF for rapid phosphate ore analysis&nbsp;</h5>Handheld X-ray fluorescence (HHXRF) analyzers have emerged as valuable tools for on-site elemental analysis of the major and penalty elements in phosphate ores. The analyzers’ portability, ease of use, and ability to deliver analytical results within seconds make them ideal for rapid decision-making in mining exploration as well as mining operations for guiding extraction, stockpile management, quality control and environmental monitoring. While handheld XRF does not replace laboratorygrade analysis for certification purposes, it provides immediate compositional information that can significantly improve operational efficiency.&nbsp;The <a target="_blank" rel="noopener noreferrer" href="https://labrulez.com/en-us/all/products/1992">Thermo Scientific™ Niton™ XL5 Plus Handheld XRF Analyzer </a>(Figure 1a) combines a compact, lightweight design with advanced analytical performance for field-based elemental analysis. Featuring a 5 W / 50 kV / 500 µA max. proprietary X-ray tube and a large-area silicon drift detector (SDD) with a graphene window, the Niton XL5 Plus analyzer delivers accurate elemental analysis across all stages of mining and exploration. The Mining Mode on the XL5 Plus analyzer can measure 41 elements, from magnesium (Mg) to uranium (U), using four optimized excitation conditions to enhance the signal-to-noise ratios of fluorescence lines across the full energy spectrum. Mining Mode uses a proprietary fundamental parameter (FP) based algorithm that accounts for the high variability of sample composition by correcting for matrix absorption and secondary enhancement effects; this improves analytical accuracy across a wide range of sample compositions. Users can optimize settings of Mining Mode and store that group of preferred settings under Profiles. Profiles enable users to have multiple analytical methods on the same instrument; the most appropriate profile for a given task can be easily selected to perform desired measurements quickly.<h4>Key findings&nbsp;</h4>The Niton XL5 Plus handheld XRF analyzer provides rapid, accurate, multi-element analysis of phosphate ores, enabling informed decision-making throughout exploration, mining, and fertilizer production. Combined with appropriate sample preparation, the analyzer delivers excellent agreement with certified laboratory values for both major constituents and critical penalty elements such as uranium and cadmium. By providing immediate analytical results at the point of need, the Niton XL5 Plus analyzer helps improve ore characterization, optimize process control, and reduce reliance on timeconsuming laboratory analyses.

News from LabRulezICPMS Library - Week 44, 2026

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Science and research

Since its establishment in 2011, CEITEC has quickly developed into a cutting-edge infrastructure for research which performs highly alongside the best institutes in Europe. Among the main priorities of CEITEC are the promotion of a motivating and dynamic international scientific environment, the provision of state-of-the-art research infrastructure, and the policy of open communication and equal opportunities.

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Linde Helium/Nitrogen Mixture (50% He in N₂) – Gas Cylinder

Linde 50% He in N₂ gas mixture for analytical and testing applications. Stable, non-flammable gas for laboratory and industrial use.

The helium/nitrogen mixture (50% helium in nitrogen) from Linde is a versatile gas blend designed for analytical, laboratory, and industrial applications.This mixture is colorless, odorless, non-toxic, and non-flammable. The combination of helium and nitrogen provides balanced physical properties, making it suitable for both analytical purposes and testing, calibration, or process applications.The higher helium content compared to standard mixtures enhances detection sensitivity in leak testing and expands its applicability in analytical workflows where stability and reproducibility are essential.<h4>Key Features</h4><ul><li>50% helium / 50% nitrogen mixture</li><li>Colorless and odorless</li><li>Non-toxic and non-flammable</li><li>Balanced physical properties</li><li>Suitable for analytical and industrial use</li><li>Stable composition</li></ul><h4>Technical Specifications</h4><ul><li>Composition: 50% helium (He), 50% nitrogen (N₂)</li><li>Gas type: gas mixture</li><li>Supply form: pressurized gas cylinder<ul><li>50 l (200 bar)</li></ul></li></ul><h4>Applications</h4><ul><li>Analytical chemistry</li><li>Gas chromatography (specific applications)</li><li>Leak detection</li><li>Calibration gases</li><li>Laboratory testing</li><li>Industrial processes</li></ul>

Linde Nitrogen 5.0 – Gas Cylinder

Linde Nitrogen 5.0 (≥99.999%) for analytics, industry, and electronics. High-purity inert gas for purging, protection, and calibration.

Nitrogen 5.0 from Linde is a high-purity inert gas with a purity of ≥ 99.999%, designed for a wide range of industrial, analytical, and technological applications.Due to its chemical inertness and high purity, it is ideal as a protective, purge, and carrier gas in demanding processes where oxidation and contamination must be prevented. Nitrogen 5.0 is also widely used as a zero gas in analytical instrumentation, enabling precise baseline calibration.Its versatility makes it suitable for applications in metallurgy, chemical processing, food production, electronics, and semiconductor manufacturing.<h4>Key Features</h4><ul><li>High purity ≥ 99.999% (5.0 grade)</li><li>Chemically inert gas</li><li>Suitable for protective atmospheres</li><li>Stable performance in analytical applications</li><li>Versatile use across industries</li><li>Supplied in pressurized cylinders</li></ul><h4>Technical Specifications</h4><ul><li>Gas: nitrogen (N₂)</li><li>Purity: ≥ 99.999% (5.0 grade)</li><li>Supply form: pressurized gas cylinder<ul><li>10 L (200 bar)</li><li>20 L (200 bar)</li><li>50 L (200 bar)</li><li>50 L (300 bar)</li></ul></li></ul><h4>Applications</h4><ul><li>Protective and purge gas in metallurgy and metal processing</li><li>Chemical, food, and electronics industries</li><li>Carrier and protective gas in semiconductor manufacturing</li><li>Cutting gas for laser and plasma cutting (e.g., stainless steel)</li><li>Zero gas in analytical and measurement systems</li></ul>

Linde Nitrogen 5.6 – Gas Cylinder

Linde Nitrogen 5.6 (≥99.9996%) for GC, analytics, and industry. Ultra-high purity gas for purging, protection, and carrier applications.

Nitrogen 5.6 from Linde is an ultra-high purity inert gas with a purity of ≥ 99.9996%, designed for demanding analytical, industrial, and research applications.Its extremely low impurity levels make it particularly suitable for gas chromatography and other analytical techniques where baseline stability and minimal interference are critical. Nitrogen 5.6 is also widely used as a protective, purge, and carrier gas in processes requiring reliable contamination control.Its versatility enables use across multiple industries as well as in advanced scientific research.<h4>Key Features</h4><ul><li>Ultra-high purity ≥ 99.9996% (5.6 grade)</li><li>Extremely low impurity levels</li><li>Chemically inert gas</li><li>Suitable for analytical applications (GC)</li><li>Stable and reproducible performance</li><li>Broad industrial and laboratory use</li></ul><h4>Technical Specifications</h4><ul><li>Gas: nitrogen (N₂)</li><li>Purity: ≥ 99.9996% (5.6 grade)</li><li>Supply form: pressurized gas cylinder<ul><li>10 L (200 bar)</li><li>50 L (200 bar)</li></ul></li></ul><h4>Applications</h4><ul><li>Protective and purge gas in metallurgy and metal processing</li><li>Chemical, food, and electronics industries</li><li>Carrier and protective gas in semiconductor manufacturing</li><li>Zero gas for analytical instruments</li><li>Purging gas in extrusion and system flushing</li><li>Carrier gas in gas chromatography (GC)</li><li>Cooling applications (e.g., shrink fitting)</li><li>Plastics processing</li><li>Construction and food industry</li><li>Biology, medicine, and research</li></ul>

Linde Nitrogen 4.6 – Gas Cylinder

Linde Nitrogen 4.6 (≥99.996%) for industry and analytics. Reliable inert gas for purging, protection, and calibration.

Nitrogen 4.6 from Linde is a high-purity inert gas with a purity of ≥ 99.996%, suitable for a wide range of industrial and analytical applications.Due to its chemical inertness, it is widely used as a protective and purge gas in processes where oxidation or contamination must be prevented. Nitrogen 4.6 is also suitable as a zero gas in analytical instrumentation, providing stable baseline conditions for accurate measurements.In industrial environments, it is commonly used as a cutting gas for laser and plasma cutting of standard materials.<h4>Key Features</h4><ul><li>Purity ≥ 99.996% (4.6 grade)</li><li>Chemically inert gas</li><li>Suitable for protective atmospheres</li><li>Stable performance in analytical applications</li><li>Versatile industrial use</li><li>Supplied in pressurized cylinders</li></ul><h4>Technical Specifications</h4><ul><li>Gas: nitrogen (N₂)</li><li>Purity: ≥ 99.996% (4.6 grade)</li><li>Supply form: pressurized gas cylinder<ul><li>20 l (200 bar)</li><li>50 l (200 bar)</li></ul></li></ul><h4>Applications</h4><ul><li>Protective and purge gas in metallurgy and metal processing</li><li>Chemical, food, and electronics industries</li><li>Carrier and protective gas in semiconductor manufacturing</li><li>Laser and plasma cutting gas</li><li>Zero gas for analytical and measurement systems</li></ul>

Linde Nitrogen 4.0 – Gas Cylinder

Linde Nitrogen 4.0 (≥99.99%) for industrial applications. Reliable inert gas for purging, protection, and cooling.

Nitrogen 4.0 from Linde is a technically pure inert gas with a purity of ≥ 99.99%, designed for a wide range of industrial and technological applications.Due to its chemical inertness, it is widely used as a protective and purging gas in processes where oxidation or unwanted reactions must be prevented. Nitrogen 4.0 is also suitable as a universal cooling medium and is applied across various industrial and research processes.Its robust and versatile performance makes it a cost-effective solution for applications where ultra-high purity is not required.<h4>Key Features</h4><ul><li>Purity ≥ 99.99% (4.0 grade)</li><li>Chemically inert gas</li><li>Suitable for protective and purging applications</li><li>Versatile industrial use</li><li>Suitable as a cooling medium</li><li>Cost-effective solution</li></ul><h4>Technical Specifications</h4><ul><li>Gas: nitrogen (N₂)</li><li>Purity: ≥ 99.99% (4.0 grade)</li><li>Supply form: pressurized gas cylinder<ul><li>10 L (200 bar)</li><li>20 L (200 bar)</li><li>50 L (200 bar)</li><li>50 L (300 bar)</li></ul></li></ul><h4>Applications</h4><ul><li>Protective gas in metallurgical, chemical, food, and electrochemical industries</li><li>Purging gas for pipes and tanks</li><li>Cooling applications (e.g., shrink fitting, plastics processing)</li><li>Construction, food industry, biology, and medicine</li><li>Welding applications (root protection and oxidation prevention)</li></ul>

Linde Nitrogen 5.3 – Gas Cylinder

Linde Nitrogen 5.3 (≥99.999%) for GC, analytics, and industry. High-purity inert gas for purging, protection, and carrier applications.

Nitrogen 5.3 from Linde is a high-purity inert gas with a purity of ≥ 99.999%, suitable for demanding analytical, industrial, and research applications.Its low impurity levels make it ideal as a carrier gas in gas chromatography and as a working gas for analytical instruments. It is also widely used as a protective, purge, and flushing gas in processes requiring a stable inert environment with minimal contamination risk.Nitrogen 5.3 offers an optimal balance between high purity and cost efficiency for a wide range of applications.<h4>Key Features</h4><ul><li>High purity ≥ 99.999% (5.3 grade)</li><li>Low trace impurity levels</li><li>Chemically inert gas</li><li>Suitable for analytical applications (GC)</li><li>Stable and reproducible performance</li><li>Versatile industrial and laboratory use</li></ul><h4>Technical Specifications</h4><ul><li>Gas: nitrogen (N₂)</li><li>Purity: ≥ 99.999% (5.3 grade)</li><li>Supply form: pressurized gas cylinder<ul><li>50 L (200 bar)</li><li>50 L (300 bar)</li></ul></li></ul><h4>Applications</h4><ul><li>Protective and purge gas in metallurgy and metal processing</li><li>Chemical, food, and electronics industries</li><li>Carrier and protective gas in semiconductor manufacturing</li><li>Zero gas for analytical instruments</li><li>Flushing gas for industrial systems</li><li>Carrier gas in gas chromatography (GC)</li><li>Cooling applications (e.g., shrink fitting)</li><li>Plastics processing</li><li>Construction and food industry</li><li>Biology, medicine, and research</li></ul>

Linde Nitrogen 6.0 – Gas Cylinder

Linde Nitrogen 6.0 (≥99.9999%) for GC, semiconductors, and research. Ultra-high purity inert gas for demanding analytical and industrial applications.

Nitrogen 6.0 from Linde is an ultra-high purity inert gas with a purity of ≥ 99.9999%, designed for the most demanding analytical, laboratory, and industrial applications.Its extremely low level of trace impurities makes it ideal for high-sensitivity analytical techniques such as gas chromatography, as well as for semiconductor manufacturing and advanced research. It ensures maximum stability, minimal contamination, and excellent reproducibility.Nitrogen 6.0 is the preferred choice wherever gas purity is critical and precise control of process conditions is required.<h4>Key Features</h4><ul><li>Ultra-high purity ≥ 99.9999% (6.0 grade)</li><li>Extremely low trace impurity levels</li><li>Chemically inert gas</li><li>Ideal for analytical and semiconductor applications</li><li>High stability and reproducibility</li><li>Suitable for high-end applications</li></ul><h4>Technical Specifications</h4><ul><li>Gas: nitrogen (N₂)</li><li>Purity: ≥ 99.9999% (6.0 grade)</li><li>Supply form: pressurized gas cylinder<ul><li>10 l (200 bar)</li><li>50 l (200 bar)</li></ul></li></ul><h4>Applications</h4><ul><li>Protective and purge gas in metallurgy and metal processing</li><li>Chemical, food, and electronics industries</li><li>Carrier and protective gas in semiconductor manufacturing</li><li>Zero gas for analytical instruments</li><li>Flushing gas for industrial systems</li><li>Carrier gas in gas chromatography (GC)</li><li>Cooling applications (e.g., shrink fitting)</li><li>Plastics processing</li><li>Construction and food industry</li><li>Biology, medicine, and research</li></ul>

Linde Food Grade Nitrogen – Gas Cylinder

Food grade nitrogen from Linde for MAP packaging, inerting, and food protection. Prevents oxidation and extends product shelf life.

Food grade nitrogen from Linde is a high-purity inert gas designed for use in the food and beverage industry. It complies with all relevant regulations for food-contact applications.Nitrogen is primarily used to displace oxygen, preventing oxidation, microbial growth, and product degradation. Its inert nature helps extend shelf life while preserving product quality, taste, and appearance.It is suitable for a wide range of applications, including modified atmosphere packaging and beverage inerting.<h4>Key Features</h4><ul><li>Food-grade quality compliant with regulations</li><li>Inert gas with no impact on taste or odor</li><li>Prevents oxidation and microbial growth</li><li>Extends shelf life of products</li><li>Suitable for MAP packaging and inerting</li><li>Colorless and odorless</li></ul><h4>Technical Specifications</h4><ul><li>Gas: nitrogen (N₂)</li><li>Grade: food grade</li><li>Supply form: gas cylinder<ul><li>20 L (200 bar)</li><li>50 L (200 bar)</li></ul></li></ul><h4>Applications</h4><h5>Food Industry:</h5><ul><li>Modified Atmosphere Packaging (MAP)</li><li>Oxygen displacement during packaging</li><li>Storage of oils and fats to prevent oxidation</li><li>Cryogenic cooling and freezing (liquid nitrogen)</li></ul><h5>Beverage Industry:</h5><ul><li>Inerting of beverages and equipment</li><li>Wine preservation and storage</li><li>Shelf-life extension of beverages</li></ul>

Linde Argon for Spectrometry – Gas Cylinder

Linde Argon ≥99.998% for spectrometry, GC, and research. High-purity inert gas ensuring stable and accurate analytical measurements.

Argon for spectrometry from Linde is a high-purity inert gas with a purity of ≥ 99.998%, designed for demanding analytical and laboratory applications.Its chemical inertness and low impurity levels make it ideal for spectrometric techniques, ensuring stable and reproducible measurement conditions. Argon is commonly used as a carrier gas in gas chromatography and as a protective gas in spectroscopic material analysis.It is particularly suitable for applications where gas purity, minimal interference, and high analytical accuracy are essential.<h4>Key Features</h4><ul><li>High purity ≥ 99.998%</li><li>Chemically inert gas</li><li>Low trace impurity levels</li><li>Suitable for spectrometry and GC</li><li>Stable and reproducible performance</li><li>Colorless and odorless</li></ul><h4>Technical Specifications</h4><ul><li>Gas: argon (Ar)</li><li>Purity: ≥ 99.998%</li><li>Supply form: gas cylinder</li></ul><h4>Applications</h4><ul><li>Carrier gas in gas chromatography (GC)</li><li>Protective gas for spectrometric material testing</li><li>Spectrometry (e.g., emission and mass spectrometry)</li><li>Measurement and analytical technologies</li><li>Research and development</li></ul>

Linde Argon 4.6 – Gas Cylinder

Linde Argon 4.6 for MIG, TIG, and plasma welding. High-purity inert gas ensuring stable arc ignition and oxidation-free weld protection.

Argon 4.6 from Linde is a high-purity inert gas primarily used as a shielding gas for welding applications. Its low ionization potential enables easy arc ignition and stable arc performance without reacting with the welded materials.Argon effectively protects the weld pool from oxidation and atmospheric contamination, ensuring high weld quality and mechanical integrity. It is suitable for a wide range of welding methods and materials.<h4>Key Features</h4><ul><li>High purity (grade 4.6)</li><li>Chemically inert gas</li><li>Low ionization potential for easy arc ignition</li><li>Stable welding arc</li><li>Protection against oxidation</li><li>Suitable for various metals and alloys</li></ul><h4>Technical Specifications</h4><ul><li>Gas: argon (Ar)</li><li>Purity: typically ≥ 99.996% (4.6 grade)</li><li>Standard: ČSN EN ISO 14175</li><li>Supply form: gas cylinder<ul><li>10 l (200 bar)</li><li>20 l (200 bar)</li><li>50 l (200 bar)</li><li>50 l (300 bar)</li></ul></li></ul><h4>Applications</h4><ul><li>Shielding gas for MIG welding<ul><li>aluminum and its alloys</li><li>copper and its alloys</li><li>nickel and its alloys</li></ul></li><li>Shielding gas for TIG (GTAW) welding<ul><li>carbon and alloy steels</li><li>stainless steels (CrNi)</li><li>aluminum, copper, nickel and alloys</li></ul></li><li>Plasma arc welding (PAW)</li><li>Root protection during welding</li><li>Welding of titanium and high-alloy materials</li><li>Filling gas for lamps and lighting</li></ul>

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