Direct Analysis of Trace Metallic Impurities in High Purity Hydrochloric Acid by 7700s/7900 ICP-MS

Application Note Semiconductor Analysis of Trace Metal Impurities in High Purity Hydrochloric Acid Using ICP-QQQ Authors Kazuo Yamanaka and Kazuhiro Sakai Agilent Technologies, Japan Introduction Hydrochloric acid (HCl) is a component of the standard RCA cleaning process used to remove…

Basic Performance of the Agilent 7700s ICP-MS for the Analysis of Semiconductor Samples Application Note Semiconductor Authors Abstract Junichi Takahashi Agilent ICP-MS systems have become the benchmark for accurate low-level analysis Agilent Technologies of trace contaminants across a wide range…

White Paper Technical Overview and Performance Capability of the Agilent 7900s ICP-MS for Semiconductor Applications Introduction Agilent ICP-MS systems are widely used for accurate low-level analysis of trace contaminants across a wide range of high-purity chemicals used in the semiconductor…

Applications of ICP-MS Measuring Inorganic Impurities in Semiconductor Manufacturing Application Compendium > Return to table of contents > Search entire document Table of contents ICP-MS and ICP-QQQ in the Semiconductor Industry 4 Agilent Has Three Decades of ICP-MS Experience Driving…