Analysis of Trace Metal Impurities in High Purity Hydrochloric Acid Using ICP-QQQ

Applications of ICP-MS Measuring Inorganic Impurities in Semiconductor Manufacturing Application Compendium > Return to table of contents > Search entire document Table of contents ICP-MS and ICP-QQQ in the Semiconductor Industry 4 Agilent Has Three Decades of ICP-MS Experience Driving…

5th Edition Handbook of ICP-QQQ Applications using the Agilent 8800 and 8900 Primer > Return to table of contents > Search entire document Foreword Agilent Technologies launched its 8800 Triple Quadrupole ICP-MS (ICP-QQQ) at the 2012 Winter Conference on Plasma…

Determination of ultra trace elements in high purity hydrogen peroxide with Agilent 8900 ICP-QQQ Application note Authors Semiconductor Kazuo Yamanaka Agilent Technologies, Japan Introduction Hydrogen peroxide (H2O2) is one of the most important process chemicals used in semiconductor device manufacturing.…

Determination of trace elements in ultrapure semiconductor grade sulfuric acid using the Agilent 8900 ICP-QQQ in MS/MS mode Application note Semiconductor Authors Michiko Yamanaka, Kazuo Yamanaka and Naoki Sugiyama, Agilent Technologies, Japan Introduction In the semiconductor industry, it is extremely…