Argon 6.0 from Linde is an ultra-high purity inert gas with a purity of ≥ 99.9999%, designed for the most demanding applications in analytics, semiconductor manufacturing, and research.
Its extremely low level of trace impurities makes it ideal for use in gas chromatography, spectrometry, and other contamination-sensitive techniques. It ensures maximum measurement stability, minimal interference, and excellent reproducibility.
Argon 6.0 is also well suited for advanced technological processes such as thin film deposition and diffusion processes, where ultra-clean protective atmospheres are required.
Key Features
- Ultra-high purity ≥ 99.9999% (6.0 grade)
- Extremely low trace impurity levels
- Chemically inert gas
- Ideal for analytical and semiconductor applications
- High stability and reproducibility
- Suitable for the most demanding applications
Technical Specifications
- Gas: argon (Ar)
- Purity: ≥ 99.9999% (6.0 grade)
- Standard: ČSN EN ISO 14175
- Supply form: gas cylinder
- 10 L (200 bar)
- 50 L (200 bar)
Applications
- Semiconductor industry
- deposition and diffusion processes
- thin film manufacturing
- Analytical applications
- carrier gas in gas chromatography (GC)
- protective gas in spectrometric analysis
- Lighting industry
- filling gas for lamps
- Measurement technologies
- Research and development
