Analysis of silicon, phosphorus and sulfur in 20% methanol using the Agilent 8800 Triple Quadrupole ICP-MS

Trace level analysis of sulfur, phosphorus, silicon and chlorine in NMP using the Agilent 8800 Triple Quadrupole ICP-MS Application note Semiconductor Author Naoki Sugiyama Agilent Technologies, Tokyo, Japan Introduction N-Methyl-2-Pyrrolidone (NMP), which has the chemical formula C5H9NO, is a stable,…

Applications of ICP-MS Measuring Inorganic Impurities in Semiconductor Manufacturing Application Compendium > Return to table of contents > Search entire document Table of contents ICP-MS and ICP-QQQ in the Semiconductor Industry 4 Agilent Has Three Decades of ICP-MS Experience Driving…

5th Edition Handbook of ICP-QQQ Applications using the Agilent 8800 and 8900 Primer > Return to table of contents > Search entire document Foreword Agilent Technologies launched its 8800 Triple Quadrupole ICP-MS (ICP-QQQ) at the 2012 Winter Conference on Plasma…

Agilent ICP-MS Journal March 2012 – Issue 49 Inside this Issue 2-3 Agilent’s New 8800 Triple Quadrupole ICP-MS: Hardware and Technology Introduction 4-5 Agilent’s 8800 ICP Triple Quad: Modes of Operation 6 On-line Isotope Dilution Analysis of Selenium using the…