Mo, 20.7.2026 | Original article from: LabRulezICPMS webinars
5 webinars: AFM, cleaning validation, DSC, ICP-QQQ, LIBS, metal identification, OES, pharmaceutical analysis, thermal analysis, TOCWebinars LabRulezICPMS Week 30/2026
LabRulez: Webinars LabRulezICPMS Week 30/2026
In the week from July 20, the following webinars await you in the field of atomic and molecular spectroscopy and spectrometry
👉 DETAILS AND REGISTRATION IN THE WEBINARS SECTION
👉 Search and filter in the largest global database with over 5 500 GC, LC, MS and spectroscopy webinars.
1. Waters Corporation: Simplifying Cleaning Validation: How TOC Streamlines Residue Detection
- Tu, 21.7.2026 17:00 CEST
- Registration
Simplify pharmaceutical cleaning validation using Total Organic Carbon (TOC) analysis. Learn how a single, rapid, non-specific method enables efficient residue detection across cleaning processes.
2. Bruker: Scripted Automation for Efficient Control and Autonomous Experimentation with AFM
- We, 22.7.2026 17:00 CEST
- Registration
Discover how the NanoScope API enables safe, flexible automation of Bruker Dimension series AFMs, supporting scripted instrument control and autonomous atomic force microscopy experiments.
3. SPECTRO Analytical Instruments: Introducing SPECTROPORT LIBS — Reliable On-Site Metal Identification
- Th, 23.7.2026 10:30 CEST
- Registration
Learn how portable OES and LIBS technologies provide fast, reliable elemental analysis for alloy identification, grade verification, and on-site quality control in manufacturing and inspection.
4. Mettler-Toledo: Crucible Selection for Thermal Analysis
- Th, 23.7.2026 16:00 CET
- Registration
Learn practical tips for selecting the right crucibles for DSC and TGA applications to improve measurement accuracy, reproducibility, and overall thermal analysis performance.
5. Agilent Technologies: Ultra Trace Analysis of High-Purity Reagents by 9500 ICP-QQQ with m-lens
- Th, 23.7.2026 20:00 CEST
- Registration
Discover how the Agilent 9500 ICP-QQQ with m-lens enables sub-ppt ultra-trace impurity analysis of high-purity reagents for semiconductor manufacturing and advanced materials applications.
