Direct Analysis of Photoresist and Related Solvents Using the Agilent 7500cs ICP-MS

Determination of Trace Metal Impurities in Semiconductor Grade Phosphoric Acid by High Sensitivity Reaction Cell ICP-MS Application Semiconductor Author Introduction Junichi Takahashi Kouichi Youno Agilent Technologies 9-1 Takakura-Cho, Hachioji-Shi Tokyo, 192-0033 Japan Contamination control in semiconductor processing is increasingly important…

Characterization of Trace Impurities in Silicon Wafers by High Sensitivity Reaction Cell ICP-MS Application Semiconductor Author Junichi Takahashi Kouichi Youno Agilent Technologies 9-1 Takakura-Cho, Hachioji-Shi Tokyo, 192-0033 Japan Abstract A newly designed, high-sensitivity reaction cell inductively coupled plasma mass spectrometer…

Application Note Semiconductor Determination of Ultratrace Impurities in Semiconductor Photoresist Using ICP-MS/MS Monitoring 20 elemental contaminants in IC photoresist by Agilent 8900 ICP-QQQ after simple dilution in PGMEA solvent Authors Introduction Yu Ying, Xiangcheng Zeng, Juane Song With the rapid…

Applications of ICP-MS Measuring Inorganic Impurities in Semiconductor Manufacturing Application Compendium > Return to table of contents > Search entire document Table of contents ICP-MS and ICP-QQQ in the Semiconductor Industry 4 Agilent Has Three Decades of ICP-MS Experience Driving…