Applications from Teledyne LABS - page 4
Open paper US EPA Method 524.3 with the Tekmar Lumin P & T Concentrator and Agilent 7890B GC and 5977A MSD System
US EPA Method 524.3 with the Tekmar Lumin P & T Concentrator and Agilent 7890B GC and 5977A MSD System
GC/MSD, Purge and Trap, GC/SQ
Instrumentation
GC/MSD, Purge and Trap, GC/SQ
Manufacturer
Agilent Technologies, Teledyne LABS
Industries
Environmental
Open paper US EPA Method 524.3 with the Tekmar Lumin P & T Concentrator and Thermo Scientific™ TRACE™ 1310 GC and ISQ™ LT MS System
US EPA Method 524.3 with the Tekmar Lumin P & T Concentrator and Thermo Scientific™ TRACE™ 1310 GC and ISQ™ LT MS System
GC/MSD, Purge and Trap, GC/SQ
Instrumentation
GC/MSD, Purge and Trap, GC/SQ
Manufacturer
Thermo Fisher Scientific, Teledyne LABS
Industries
Environmental
Open paper US EPA Method 524.4 with the Tekmar Lumin P & T Concentrator and Thermo Scientific™ TRACE™ 1310 GC and ISQ™ LT MS System
US EPA Method 524.4 with the Tekmar Lumin P & T Concentrator and Thermo Scientific™ TRACE™ 1310 GC and ISQ™ LT MS System
GC/MSD, Purge and Trap, GC/SQ
Instrumentation
GC/MSD, Purge and Trap, GC/SQ
Manufacturer
Thermo Fisher Scientific, Teledyne LABS
Industries
Environmental
Open paper USEPA Method 524.4 Using the Teledyne Tekmar Atomx and Thermo Scientific™ GC/MS System with New Helium Saver Module
USEPA Method 524.4 Using the Teledyne Tekmar Atomx and Thermo Scientific™ GC/MS System with New Helium Saver Module
GC/MSD, Purge and Trap, GC/SQ
Instrumentation
GC/MSD, Purge and Trap, GC/SQ
Manufacturer
Thermo Fisher Scientific, Teledyne LABS
Industries
Environmental
Open paper Lumin Automated VOC Sample Prep System
Lumin Automated VOC Sample Prep System
Purge and Trap
Instrumentation
Purge and Trap
Manufacturer
Teledyne LABS
Industries
Open paper Exploring US EPA Method 524 Purge and Trap Variables: Water Vapor Reduction and Minimizing Cycle Time
Exploring US EPA Method 524 Purge and Trap Variables: Water Vapor Reduction and Minimizing Cycle Time
GC/MSD, Purge and Trap, GC/SQ
Instrumentation
GC/MSD, Purge and Trap, GC/SQ
Manufacturer
Agilent Technologies, Teledyne LABS
Industries
Environmental
Open paper Meeting the Korean Method ES 04601.2 for 1,4- Dioxane (1,4-다이옥산-헤드스페이스/기체크로마토그래피- 질량분석법) with Static Headspace GC/MS
Meeting the Korean Method ES 04601.2 for 1,4- Dioxane (1,4-다이옥산-헤드스페이스/기체크로마토그래피- 질량분석법) with Static Headspace GC/MS
GC/MSD, HeadSpace, GC/SQ
Instrumentation
GC/MSD, HeadSpace, GC/SQ
Manufacturer
Agilent Technologies, Teledyne LABS
Industries
Environmental
Open paper Meeting the Korean Method ES 04602.1b for Vinyl Chloride, Acrylonitrile, and Bromoform (염화비닐, 아크릴로니트릴, 브로모포름) with Static and Dynamic Headspace GC/MS
Meeting the Korean Method ES 04602.1b for Vinyl Chloride, Acrylonitrile, and Bromoform (염화비닐, 아크릴로니트릴, 브로모포름) with Static and Dynamic Headspace GC/MS
GC/MSD, HeadSpace, GC/SQ
Instrumentation
GC/MSD, HeadSpace, GC/SQ
Manufacturer
Agilent Technologies, Teledyne LABS
Industries
Environmental
Open paper Meeting the Korean Method ES 04603.2b for 12 VOC (휘발성유기화합물) with Static and Dynamic Headspace GC/MS
Meeting the Korean Method ES 04603.2b for 12 VOC (휘발성유기화합물) with Static and Dynamic Headspace GC/MS
GC/MSD, HeadSpace, GC/SQ
Instrumentation
GC/MSD, HeadSpace, GC/SQ
Manufacturer
Agilent Technologies, Teledyne LABS
Industries
Environmental
Open paper Meeting the Korean Method ES 04605.3 for Formaldehyde (폼알데하이드) with Static Headspace GC/MS
Meeting the Korean Method ES 04605.3 for Formaldehyde (폼알데하이드) with Static Headspace GC/MS
GC/MSD, HeadSpace, GC/SQ
Instrumentation
GC/MSD, HeadSpace, GC/SQ
Manufacturer
Agilent Technologies, Teledyne LABS
Industries
Environmental
