Applications focused on GC/SQ from Teledyne LABS - page 4
Open paper Meeting the Korean Method ES 04601.2 for 1,4- Dioxane (1,4-다이옥산-헤드스페이스/기체크로마토그래피- 질량분석법) with Static Headspace GC/MS
Meeting the Korean Method ES 04601.2 for 1,4- Dioxane (1,4-다이옥산-헤드스페이스/기체크로마토그래피- 질량분석법) with Static Headspace GC/MS
GC/MSD, HeadSpace, GC/SQ
Instrumentation
GC/MSD, HeadSpace, GC/SQ
Manufacturer
Agilent Technologies, Teledyne LABS
Industries
Environmental
Open paper Meeting the Korean Method ES 04602.1b for Vinyl Chloride, Acrylonitrile, and Bromoform (염화비닐, 아크릴로니트릴, 브로모포름) with Static and Dynamic Headspace GC/MS
Meeting the Korean Method ES 04602.1b for Vinyl Chloride, Acrylonitrile, and Bromoform (염화비닐, 아크릴로니트릴, 브로모포름) with Static and Dynamic Headspace GC/MS
GC/MSD, HeadSpace, GC/SQ
Instrumentation
GC/MSD, HeadSpace, GC/SQ
Manufacturer
Agilent Technologies, Teledyne LABS
Industries
Environmental
Open paper Meeting the Korean Method ES 04603.2b for 12 VOC (휘발성유기화합물) with Static and Dynamic Headspace GC/MS
Meeting the Korean Method ES 04603.2b for 12 VOC (휘발성유기화합물) with Static and Dynamic Headspace GC/MS
GC/MSD, HeadSpace, GC/SQ
Instrumentation
GC/MSD, HeadSpace, GC/SQ
Manufacturer
Agilent Technologies, Teledyne LABS
Industries
Environmental
Open paper Meeting the Korean Method ES 04605.3 for Formaldehyde (폼알데하이드) with Static Headspace GC/MS
Meeting the Korean Method ES 04605.3 for Formaldehyde (폼알데하이드) with Static Headspace GC/MS
GC/MSD, HeadSpace, GC/SQ
Instrumentation
GC/MSD, HeadSpace, GC/SQ
Manufacturer
Agilent Technologies, Teledyne LABS
Industries
Environmental
Open paper Meeting the Korean Method ES 04607.1 for Naphthalene (나프탈렌) with Static and Dynamic Headspace GC/MS
Meeting the Korean Method ES 04607.1 for Naphthalene (나프탈렌) with Static and Dynamic Headspace GC/MS
GC/MSD, HeadSpace, GC/SQ
Instrumentation
GC/MSD, HeadSpace, GC/SQ
Manufacturer
Agilent Technologies, Teledyne LABS
Industries
Environmental
Open paper US EPA Method 524.2 with the Teledyne Tekmar Lumin P&T Concentrator and Agilent 7890B GC / 5977A MS
US EPA Method 524.2 with the Teledyne Tekmar Lumin P&T Concentrator and Agilent 7890B GC / 5977A MS
GC/MSD, Purge and Trap, GC/SQ
Instrumentation
GC/MSD, Purge and Trap, GC/SQ
Manufacturer
Agilent Technologies, Teledyne LABS
Industries
Environmental
Open paper US EPA Method 624 with the Tekmar Lumin and the Agilent 7890B GC / 5977A MS
US EPA Method 624 with the Tekmar Lumin and the Agilent 7890B GC / 5977A MS
GC/MSD, Purge and Trap, GC/SQ
Instrumentation
GC/MSD, Purge and Trap, GC/SQ
Manufacturer
Agilent Technologies, Teledyne LABS
Industries
Environmental
Open paper US EPA Method 8260 with the Tekmar Lumin and the Agilent 7890B GC / 5977A MS
US EPA Method 8260 with the Tekmar Lumin and the Agilent 7890B GC / 5977A MS
GC/MSD, Purge and Trap, GC/SQ
Instrumentation
GC/MSD, Purge and Trap, GC/SQ
Manufacturer
Agilent Technologies, Teledyne LABS
Industries
Environmental
Open paper US EPA Method 524.2 with the Teledyne Tekmar Lumin P&T Concentrator and PerkinElmer® Clarus® 600 GC/Clarus® SQ8T MS
US EPA Method 524.2 with the Teledyne Tekmar Lumin P&T Concentrator and PerkinElmer® Clarus® 600 GC/Clarus® SQ8T MS
GC/MSD, Purge and Trap, GC/SQ
Instrumentation
GC/MSD, Purge and Trap, GC/SQ
Manufacturer
PerkinElmer, Teledyne LABS
Industries
Environmental
Open paper US EPA Method 624 with the Tekmar Lumin and the PerkinElmer® Clarus® 600 GC/SQ 8T MS
US EPA Method 624 with the Tekmar Lumin and the PerkinElmer® Clarus® 600 GC/SQ 8T MS
GC/MSD, Purge and Trap, GC/SQ
Instrumentation
GC/MSD, Purge and Trap, GC/SQ
Manufacturer
PerkinElmer, Teledyne LABS
Industries
Environmental
