Next-Generation Bath Monitoring for Semiconductor Manufacturing

Maintaining tight control of critical bath chemistries is essential for achieving consistent process performance, product quality and manufacturing yield in semiconductor production. However, some key bath components remain difficult to measure reliably, creating challenges for effective process monitoring and real-time decision-making. While wet chemistry methods and NIR spectroscopy have long supported semiconductor manufacturing, companies continue to evaluate new analytical technologies that can provide faster, more comprehensive insight into critical process conditions.

Join Brian Benner, Principal Scientist at Micron Technology, and Elena Hagemann, Spectroscopy Product Manager at Metrohm USA, as they discuss how leading semiconductor manufacturers are evaluating next-generation technologies for bath monitoring and process control. Learn how industry leaders assess analytical strategies for critical process chemistries and explore the emerging role of Raman spectroscopy in supporting real-time monitoring and manufacturing consistency.

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Why Attend? 

Learn how leading semiconductor manufacturers are approaching next-generation bath monitoring and gain practical insights into evaluating analytical technologies for process control applications. Whether you are assessing new monitoring approaches, looking to improve measurement reliability or exploring alternatives to existing technologies, this webinar will provide valuable perspective on the future of semiconductor process monitoring.

Who Should Attend?

This mini course is designed for professionals involved in semiconductor manufacturing, including process and manufacturing engineers, process control and automation specialists, PAT, analytical and metrology teams and technical and operations leaders.

Presenter: Brian Benner (Principal Scientist, Micron Technology)

Brian Benner is a Principal Scientist at Micron Technology with more than 25 years of experience in semiconductor manufacturing. Throughout his career, he has led the development and optimization of inline and online monitoring and process control strategies using a wide range of analytical technologies. In his current role, Brian evaluates emerging monitoring technologies for potential implementation in semiconductor manufacturing and leads a team focused on predictive model deployment using Near Infrared (NIR) spectroscopy. His work centers on advancing process monitoring and control to support manufacturing performance, consistency and innovation.

Presenter: Elena Hagemann (Product Manager, Process Spectroscopy, Metrohm USA)

Elena Hagemann is the Product Manager for Process Spectroscopy at Metrohm USA, where she focuses on advancing Process Analytical Technology (PAT) through Near-Infrared (NIR) and Raman spectroscopy. With more than 12 years of experience in process spectroscopy, Elena works with manufacturers to evaluate and implement analytical technologies that support real-time process monitoring and control. She combines deep technical expertise with practical industry knowledge to help bridge the gap between laboratory innovation and manufacturing applications.