Comprehensive Analysis of Oligomeric Impurities, Monomer Composition, and End-Group Information in ArFPhotoresist Block Copolymers Using Q-TOF High-Resolution Mass Spectrometry

Posters | 2025 | Agilent Technologies | ASMSInstrumentation
LC/MS, LC/MS/MS, LC/TOF, LC/HRMS
Industries
Semiconductor Analysis
Manufacturer
Agilent Technologies
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