Investigation of Ni on Si thin film with ARL EQUINOX 100 X-ray Diffractometer

Význam tématu

Thin film and coating characterization by XRD and XRR is essential for developing functional materials in photovoltaics, optoelectronics and advanced optical systems. Structural parameters and layer thickness of nanometer-scale films directly influence device performance, making rapid and reliable analysis crucial for research, quality control and industrial applications.

Cíle a přehled studie / článku

This application note presents the use of the Thermo Scientific ARL EQUINOX 100 benchtop diffractometer to analyze a Ni layer on a Si substrate. The objectives are to demonstrate fast GIXRD phase identification and precise XRR thickness measurement, highlighting instrument capabilities for routine thin film investigation.

Použitá metodika a instrumentace

Grazing incidence X-ray diffraction (GIXRD) was performed at a fixed incident angle of 0.5° to isolate the Ni layer signal. X-ray reflectometry (XRR) measured film thickness and roughness based on interference fringes between reflected beams. The ARL EQUINOX 100 employs a high-brilliance Cu micro-focus tube (50 W) with mirror optics and a curved position sensitive detector (CPS) for simultaneous peak collection. Thin film attachment provides computer-controlled ω and z alignment. Data processing and analysis used SYMPHONIX for primary reduction, MATCH! with the COD database for phase identification, and MAUD for XRR refinement.

Hlavní výsledky a diskuse

• GIXRD identified the Ni face-centered cubic structure (space group Fm3m, a = 3.5238 Å) within 1 minute of acquisition.
• XRR refinement yielded a Ni layer thickness of 320.7 ± 1.1 Å and roughness of 3.78 ± 0.32 Å, showing a 5 % deviation from the nominal 306.9 Å value.

The rapid GIXRD scan provides clear phase assignment, while the XRR model demonstrates accurate thickness determination on a benchtop system.

Přínosy a praktické využití metody

• Measurement speed: full GIXRD scan in 1 min enables high-throughput screening.
• Ease of use: straightforward sample alignment without advanced operator skills.
• Portability: benchtop design allows flexible lab placement or field use without special infrastructure.
• Combined analysis: simultaneous structural and thickness evaluation supports QC/QA workflows in industrial and academic environments.

Budoucí trendy a možnosti využití

Advancements may include in situ monitoring of film growth, temperature-dependent structural studies, multilayer and hybrid material analysis, and integration with automated process control. Enhanced detector sensitivity and software automation will further shorten analysis times and improve precision.

Závěr

The ARL EQUINOX 100 paired with the thin film attachment offers a versatile, user-friendly platform for fast and accurate GIXRD and XRR characterization of thin films. Its benchtop format, rapid data acquisition and reliable analysis make it suitable for both routine QC/QA and advanced research in analytical chemistry.

Použitá instrumentace

• Thermo Scientific ARL EQUINOX 100 benchtop diffractometer
• Cu micro-focus X-ray tube (50 W) with mirror optics
• Curved position sensitive detector (CPS)
• Computer-controlled ω and z thin film attachment
• Software: SYMPHONIX, MATCH! (with COD database), MAUD