Application Note Semiconductor Direct Analysis of Metallic Impurities in SiC and GaN Wafers by LA-GED-MSAG-ICP-MS/MS Automated analysis using Agilent 8900 ICP-QQQ with Laser Ablation, Gas Exchange Device, and Metal Standard Aerosol Generation Authors Koshi Suzuki, Tatsu Ichinose, and Katsu Kawabata…
Key words
msag, sic, ged, wafer, gan, ablation, wafers, galvo, gas, icp, vpd, mirror, amount, trxrf, element