Applications from the field of Semiconductor Analysis from Agilent Technologies - page 6

Open paper Direct Measurement of Metallic Impurities in 20% Ammonium Hydroxide by 7700s/7900 ICP-MS
ICPMS

Direct Measurement of Metallic Impurities in 20% Ammonium Hydroxide by 7700s/7900 ICP-MS

ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Open paper Agilent ICP-MS Journal (July 2017 – Issue 69)
ICPMS

Agilent ICP-MS Journal (July 2017 – Issue 69)

ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Environmental, Pharma & Biopharma, Semiconductor Analysis
Open paper Determination of ultra trace elements in high purity hydrogen peroxide with Agilent 8900 ICP-QQQ
ICPMS

Determination of ultra trace elements in high purity hydrogen peroxide with Agilent 8900 ICP-QQQ

ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Open paper Agilent ICP-MS Journal (December 2016 – Issue 67)
ICPMS

Agilent ICP-MS Journal (December 2016 – Issue 67)

ICP/MS, Speciation analysis, ICP/MS/MS
Instrumentation
ICP/MS, Speciation analysis, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Environmental, Semiconductor Analysis
Open paper Quantitative analysis of high purity metals using laser ablation coupled to an Agilent 7900 ICP-MS
ICPMS

Quantitative analysis of high purity metals using laser ablation coupled to an Agilent 7900 ICP-MS

ICP/MS, Laser ablation
Instrumentation
ICP/MS, Laser ablation
Manufacturer
Agilent Technologies
Industries
Energy & Chemicals , Semiconductor Analysis
Open paper Determination of challenging elements in ultrapure semiconductor grade sulfuric acid by Triple Quadrupole ICP-MS
ICPMS

Determination of challenging elements in ultrapure semiconductor grade sulfuric acid by Triple Quadrupole ICP-MS

ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Open paper Ultra trace measurement of potassium and other elements in ultrapure water using the Agilent 8800 ICP-QQQ in cool plasma reaction cell mode
ICPMS

Ultra trace measurement of potassium and other elements in ultrapure water using the Agilent 8800 ICP-QQQ in cool plasma reaction cell mode

ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Open paper Improvement of ICP-MS detectability of phosphorus and titanium in high purity silicon samples using the Agilent 8800 Triple Quadrupole ICP-MS
ICPMS

Improvement of ICP-MS detectability of phosphorus and titanium in high purity silicon samples using the Agilent 8800 Triple Quadrupole ICP-MS

ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Open paper WCPS: Efficient Removal of Polyatomic Ions by ICP-MS Equipped with Novel Reaction Cell: Examples of Highly Purified Chemicals Used for Semiconductor
ICPMS

WCPS: Efficient Removal of Polyatomic Ions by ICP-MS Equipped with Novel Reaction Cell: Examples of Highly Purified Chemicals Used for Semiconductor

ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Open paper WCPS: AGILENT 8800 TRIPLE QUADRUPOLE ICP-MS WINTER PLASMA CONFERENCE 2012 POSTERS
ICPMS

WCPS: AGILENT 8800 TRIPLE QUADRUPOLE ICP-MS WINTER PLASMA CONFERENCE 2012 POSTERS

ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Environmental, Semiconductor Analysis