Applications from the field of Semiconductor Analysis - page 12

Open paper Basic Performance of the Agilent 7700s ICP-MS for the Analysis of Semiconductor Samples

Basic Performance of the Agilent 7700s ICP-MS for the Analysis of Semiconductor Samples

Technical notes
| 2010 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Open paper Characterization of Amorphous and Microcrystalline Silicon using Raman Spectroscopy

Characterization of Amorphous and Microcrystalline Silicon using Raman Spectroscopy

Applications
| 2009 | Thermo Fisher Scientific
RAMAN Spectroscopy, Microscopy
Instrumentation
RAMAN Spectroscopy, Microscopy
Manufacturer
Thermo Fisher Scientific
Industries
Materials Testing, Semiconductor Analysis
Open paper Ultratrace Analysis of Solar (Photovoltaic) Grade Bulk Silicon by ICP-MS

Ultratrace Analysis of Solar (Photovoltaic) Grade Bulk Silicon by ICP-MS

Applications
| 2008 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Open paper Analysis of Electroceramics by Laser Ablation ICP-MS

Analysis of Electroceramics by Laser Ablation ICP-MS

Applications
| 2004 | Agilent Technologies
ICP/MS, Laser ablation
Instrumentation
ICP/MS, Laser ablation
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Open paper Direct Analysis of Photoresist and Related Solvents Using the Agilent 7500cs ICP-MS

Direct Analysis of Photoresist and Related Solvents Using the Agilent 7500cs ICP-MS

Applications
| 2004 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Open paper Determination of Trace Metal Impurities in Semiconductor Grade Phosphoric Acid by High Sensitivity Reaction Cell ICP-MS

Determination of Trace Metal Impurities in Semiconductor Grade Phosphoric Acid by High Sensitivity Reaction Cell ICP-MS

Applications
| 2003 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Open paper Characterization of Trace Impurities in Silicon Wafers by High Sensitivity Reaction Cell ICP-MS

Characterization of Trace Impurities in Silicon Wafers by High Sensitivity Reaction Cell ICP-MS

Applications
| 2003 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Open paper Characterization of Surface Metal Contamination on Silicon Wafers Using Surface Metal Extraction Inductively Coupled Plasma Mass Spectrometry (SME- ICP-MS)

Characterization of Surface Metal Contamination on Silicon Wafers Using Surface Metal Extraction Inductively Coupled Plasma Mass Spectrometry (SME- ICP-MS)

Applications
| 2001 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis