Applications from the field of Semiconductor Analysis from Agilent Technologies - page 8

Open paper Characterization of Surface Metal Contamination on Silicon Wafers Using Surface Metal Extraction Inductively Coupled Plasma Mass Spectrometry (SME- ICP-MS)

Characterization of Surface Metal Contamination on Silicon Wafers Using Surface Metal Extraction Inductively Coupled Plasma Mass Spectrometry (SME- ICP-MS)

Applications
| 2001 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis