Applications from the field of Semiconductor Analysis from Agilent Technologies - page 5

Open paper Ultra-low level determination of phosphorus, sulfur, silicon and chlorine using the Agilent 8900 ICP-QQQ

Ultra-low level determination of phosphorus, sulfur, silicon and chlorine using the Agilent 8900 ICP-QQQ

Applications
| 2018 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Open paper Determination of trace elements in ultrapure semiconductor grade sulfuric acid using the Agilent 8900 ICP-QQQ in MS/MS mode

Determination of trace elements in ultrapure semiconductor grade sulfuric acid using the Agilent 8900 ICP-QQQ in MS/MS mode

Applications
| 2018 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Open paper Agilent ICP-MS Journal (April 2018. Issue 72)

Agilent ICP-MS Journal (April 2018. Issue 72)

Others
| 2018 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Food & Agriculture, Semiconductor Analysis
Open paper WCPS: Accurate determination of Eu, and Sm in ultra-pure barium carbonate materials by ICP-QQQ

WCPS: Accurate determination of Eu, and Sm in ultra-pure barium carbonate materials by ICP-QQQ

Posters
| 2017 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Materials Testing, Semiconductor Analysis
Open paper Analysis of Trace Metal Impurities in High Purity Hydrochloric Acid Using ICP-QQQ

Analysis of Trace Metal Impurities in High Purity Hydrochloric Acid Using ICP-QQQ

Applications
| 2017 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Open paper Direct Measurement of Metallic Impurities in 20% Ammonium Hydroxide by 7700s/7900 ICP-MS

Direct Measurement of Metallic Impurities in 20% Ammonium Hydroxide by 7700s/7900 ICP-MS

Applications
| 2017 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Open paper Agilent ICP-MS Journal (July 2017 – Issue 69)

Agilent ICP-MS Journal (July 2017 – Issue 69)

Others
| 2017 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Environmental, Pharma & Biopharma, Semiconductor Analysis
Open paper Determination of ultra trace elements in high purity hydrogen peroxide with Agilent 8900 ICP-QQQ

Determination of ultra trace elements in high purity hydrogen peroxide with Agilent 8900 ICP-QQQ

Applications
| 2016 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Open paper Gas chromatographic separation of metal carbonyls in carbon monoxide with detection using the Agilent 8800 ICP-QQQ

Gas chromatographic separation of metal carbonyls in carbon monoxide with detection using the Agilent 8800 ICP-QQQ

Applications
| 2016 | Agilent Technologies
GC, ICP/MS, Speciation analysis, ICP/MS/MS
Instrumentation
GC, ICP/MS, Speciation analysis, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Energy & Chemicals , Semiconductor Analysis
Open paper Agilent ICP-MS Journal (December 2016 – Issue 67)

Agilent ICP-MS Journal (December 2016 – Issue 67)

Others
| 2016 | Agilent Technologies
ICP/MS, Speciation analysis, ICP/MS/MS
Instrumentation
ICP/MS, Speciation analysis, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Environmental, Semiconductor Analysis