Applications from the field of Semiconductor Analysis focused on ICP/MS/MS - page 5

Open paper WCPS: The Analysis and Stability of High Purity TetraMethylAm m onium Hyrdoxide (TMAH) with the Agilent 8900 QQQ-ICPMS

WCPS: The Analysis and Stability of High Purity TetraMethylAm m onium Hyrdoxide (TMAH) with the Agilent 8900 QQQ-ICPMS

ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Open paper WCPS: Determination of Ultra Trace Elements in High Purity Reagents by Automatic Standard Addition Methods Using prepFAST S - ICP-MS/MS

WCPS: Determination of Ultra Trace Elements in High Purity Reagents by Automatic Standard Addition Methods Using prepFAST S - ICP-MS/MS

Sample Preparation, ICP/MS, ICP/MS/MS
Instrumentation
Sample Preparation, ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies, Elemental Scientific
Industries
Energy & Chemicals , Semiconductor Analysis
Open paper Analysis of Trace Metal Impurities in High Purity Hydrochloric Acid Using ICP-QQQ

Analysis of Trace Metal Impurities in High Purity Hydrochloric Acid Using ICP-QQQ

ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Open paper WCPS: Accurate determination of Eu, and Sm in ultra-pure barium carbonate materials by ICP-QQQ

WCPS: Accurate determination of Eu, and Sm in ultra-pure barium carbonate materials by ICP-QQQ

ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Materials Testing, Semiconductor Analysis
Open paper Agilent ICP-MS Journal (December 2016 – Issue 67)

Agilent ICP-MS Journal (December 2016 – Issue 67)

ICP/MS, Speciation analysis, ICP/MS/MS
Instrumentation
ICP/MS, Speciation analysis, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Environmental, Semiconductor Analysis
Open paper Gas chromatographic separation of metal carbonyls in carbon monoxide with detection using the Agilent 8800 ICP-QQQ

Gas chromatographic separation of metal carbonyls in carbon monoxide with detection using the Agilent 8800 ICP-QQQ

GC, ICP/MS, Speciation analysis, ICP/MS/MS
Instrumentation
GC, ICP/MS, Speciation analysis, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Energy & Chemicals , Semiconductor Analysis
Open paper Determination of ultra trace elements in high purity hydrogen peroxide with Agilent 8900 ICP-QQQ

Determination of ultra trace elements in high purity hydrogen peroxide with Agilent 8900 ICP-QQQ

ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Open paper Sub-ppb detection limits for hydride gas contaminants using GC-ICP-QQQ

Sub-ppb detection limits for hydride gas contaminants using GC-ICP-QQQ

GC, Speciation analysis, ICP/MS/MS
Instrumentation
GC, Speciation analysis, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Energy & Chemicals , Semiconductor Analysis
Open paper Determination of challenging elements in ultrapure semiconductor grade sulfuric acid by Triple Quadrupole ICP-MS

Determination of challenging elements in ultrapure semiconductor grade sulfuric acid by Triple Quadrupole ICP-MS

ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Open paper Ultra trace measurement of potassium and other elements in ultrapure water using the Agilent 8800 ICP-QQQ in cool plasma reaction cell mode

Ultra trace measurement of potassium and other elements in ultrapure water using the Agilent 8800 ICP-QQQ in cool plasma reaction cell mode

ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis