Analysis of 50 nm Silica Nanoparticles in Semiconductor Process Chemicals by spICP-MS/MS

Applications of ICP-MS Measuring Inorganic Impurities in Semiconductor Manufacturing Application Compendium > Return to table of contents > Search entire document Table of contents ICP-MS and ICP-QQQ in the Semiconductor Industry 4 Agilent Has Three Decades of ICP-MS Experience Driving…

Application Note Semiconductor Multielement Nanoparticle Analysis of Semiconductor Process Chemicals Using spICP-QQQ Characterization of Ag, Fe3O4, Al2O3, Au, and SiO2 NPs in TMAH in a single analytical run Author Yoshinori Shimamura, Donna Hsu, and Michiko Yamanaka Agilent Technologies, Inc. Introduction…

Application Note Semiconductor Analysis of Nanoparticles in Organic Reagents by Agilent 8900 ICP-QQQ in spICP-MS Mode Determination of 25 and 30 nm Fe3O4 NPs in low-particle concentration solutions Author Donna Hsu, Yoshinori Shimamura, Brian Liao, and Michiko Yamanaka1 Chun-Hua Chen…

High sensitivity analysis of SiO2 nanoparticles using the Agilent 8900 ICP-QQQ in MS/MS mode Application note Materials, environmental, food Authors Michiko Yamanaka and Takayuki Itagaki Agilent Technologies, Japan Steve Wilbur Agilent Technologies, USA Introduction Nanomaterials are increasingly used in industrial…