High sensitivity analysis of SiO2 nanoparticles using the Agilent 8900 ICP-QQQ in MS/MS mode

Application Note Semiconductor Multielement Nanoparticle Analysis of Semiconductor Process Chemicals Using spICP-QQQ Characterization of Ag, Fe3O4, Al2O3, Au, and SiO2 NPs in TMAH in a single analytical run Author Yoshinori Shimamura, Donna Hsu, and Michiko Yamanaka Agilent Technologies, Inc. Introduction…

Application Note Semiconductor Analysis of 50 nm Silica Nanoparticles in Semiconductor Process Chemicals by spICP-MS/MS Accurate detection of insoluble SiO2 NPs in high purity acids and solvents by Agilent 8900 ICP-QQQ Authors Introduction Donna Hsu, Brian Liao, Katsuo Mizobuchi, Michiko…

Application Note Semiconductor Analysis of Nanoparticles in Organic Reagents by Agilent 8900 ICP-QQQ in spICP-MS Mode Determination of 25 and 30 nm Fe3O4 NPs in low-particle concentration solutions Author Donna Hsu, Yoshinori Shimamura, Brian Liao, and Michiko Yamanaka1 Chun-Hua Chen…

Yoshinori Shimamuraand Satoshi Kondo Particle Analysis of Two High Purity Grades of N-Methyl-2Pyrrolidone (NMP) using Single Particle (sp)ICP-MS/MS Method Agilent Technologies, Inc., Tokyo, Japan Sample analysis performed in collaboration with Kakeru Usuba, Naoki Katano, and Takao Shibasaki EWCPS 2023 Th…