Improvement of ICP-MS detectability of phosphorus and titanium in high purity silicon samples using the Agilent 8800 Triple Quadrupole ICP-MS Application note Semiconductor Authors Junichi Takahashi Agilent Technologies, Tokyo, Japan Introduction In the past three decades monitoring and controlling metallic…
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cool, gas, vpd, bec, tune, icp, silicon, cell, semiconductor, element, argon, plasma, qms, matrix, wafer