Improvement of ICP-MS detectability of phosphorus and titanium in high purity silicon samples using the Agilent 8800 Triple Quadrupole ICP-MS

Applications of ICP-MS Measuring Inorganic Impurities in Semiconductor Manufacturing Application Compendium > Return to table of contents > Search entire document Table of contents ICP-MS and ICP-QQQ in the Semiconductor Industry 4 Agilent Has Three Decades of ICP-MS Experience Driving…

White Paper Technical Overview and Performance Capability of the Agilent 7900s ICP-MS for Semiconductor Applications Introduction Agilent ICP-MS systems are widely used for accurate low-level analysis of trace contaminants across a wide range of high-purity chemicals used in the semiconductor…

Application Note Semiconductor Automated Surface Analysis of Metal Contaminants in Silicon Wafers by Online VPD-ICP-MS/MS Agilent 8900 ICP-QQQ integrated with IAS Expert PS VPD provides the sensitivity and robustness required for 24/7 contamination control of wafers Authors Introduction Tatsu Ichinose…

Application Note Semiconductor Analysis of Ultratrace Impurities in High Silicon Matrix Samples by ICP-QQQ Determination of 38 elements in high matrix samples using an Agilent 8900 ICP-QQQ with optional m-lens Authors Introduction Yu Ying Agilent Technologies (China) Co., Ltd. Rapid…