Aplikace z oblasti Polovodiče od Agilent Technologies - strana 8

Otevřít dokument Characterization of Surface Metal Contamination on Silicon Wafers Using Surface Metal Extraction Inductively Coupled Plasma Mass Spectrometry (SME- ICP-MS)

Characterization of Surface Metal Contamination on Silicon Wafers Using Surface Metal Extraction Inductively Coupled Plasma Mass Spectrometry (SME- ICP-MS)

Aplikace
| 2001 | Agilent Technologies
ICP/MS
Instrumentace
ICP/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče