Aplikace z oblasti Polovodiče se zaměřením na ICP/MS/MS - strana 1
Otevřít dokument Agilent 9500 ICP‑QQQ with m‑Lens for Ultratrace Analysis of High‑Purity Reagents
Agilent 9500 ICP‑QQQ with m‑Lens for Ultratrace Analysis of High‑Purity Reagents
ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Otevřít dokument Consumable Solutions for Semiconductor Analysis
Consumable Solutions for Semiconductor Analysis
ICP/MS/MS, ICP/MS
Instrumentace
ICP/MS/MS, ICP/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Otevřít dokument Trace Elemental Analysis of Precursor Materials Using ICP-MS/MS
Trace Elemental Analysis of Precursor Materials Using ICP-MS/MS
ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Otevřít dokument Analysis of photovoltaic grade silicon using triple quadrupole inductively coupled plasma mass spectrometry (ICP-MS)
Analysis of photovoltaic grade silicon using triple quadrupole inductively coupled plasma mass spectrometry (ICP-MS)
ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Thermo Fisher Scientific
Zaměření
Průmysl a chemie, Polovodiče
Otevřít dokument Ultratrace Impurity Analysis of Ultrapure Water with Low Boron Background by ICP-MS/MS
Ultratrace Impurity Analysis of Ultrapure Water with Low Boron Background by ICP-MS/MS
ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Otevřít dokument Analysis of 50 nm Silica Nanoparticles in Semiconductor Process Chemicals by spICP-MS/MS
Analysis of 50 nm Silica Nanoparticles in Semiconductor Process Chemicals by spICP-MS/MS
ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Otevřít dokument WCPS: Particle Analysis of Two High Purity Grades of N-Methyl-2- Pyrrolidone (NMP) using Single Particle (sp)ICP-MS/MS Method
WCPS: Particle Analysis of Two High Purity Grades of N-Methyl-2- Pyrrolidone (NMP) using Single Particle (sp)ICP-MS/MS Method
ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Agilent Technologies
Zaměření
Průmysl a chemie, Polovodiče
Otevřít dokument Direct Analysis of Metallic Impurities in SiC and GaN Wafers by LA-GED-MSAG-ICP-MS/MS
Direct Analysis of Metallic Impurities in SiC and GaN Wafers by LA-GED-MSAG-ICP-MS/MS
ICP/MS, ICP/MS/MS, Laserová ablace
Instrumentace
ICP/MS, ICP/MS/MS, Laserová ablace
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Otevřít dokument Automated Surface Analysis of Metal Contaminants in Silicon Wafers by Online VPD-ICP-MS/MS
Automated Surface Analysis of Metal Contaminants in Silicon Wafers by Online VPD-ICP-MS/MS
ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Otevřít dokument Determination of Ultratrace Impurities in Semiconductor Photoresist Using ICP-MS/MS
Determination of Ultratrace Impurities in Semiconductor Photoresist Using ICP-MS/MS
ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
