Aplikace z oblasti Polovodiče se zaměřením na ICP/MS od Agilent Technologies - strana 1
Otevřít dokument A Practical Guide for Understanding and Testing Hazardous Substances in Electrical and Electronic Products
A Practical Guide for Understanding and Testing Hazardous Substances in Electrical and Electronic Products
GC/MSD, LC/MS, LC/MS/MS, ICP-OES, AAS, ICP/MS, UV–VIS Spektrofotometrie, GC/MS/MS, GC/HRMS, LC/TOF, LC/HRMS, GC/Q-TOF, GC/QQQ, LC/QQQ, LC/SQ, HPLC, FTIR Spektroskopie
Instrumentace
GC/MSD, LC/MS, LC/MS/MS, ICP-OES, AAS, ICP/MS, UV–VIS Spektrofotometrie, GC/MS/MS, GC/HRMS, LC/TOF, LC/HRMS, GC/Q-TOF, GC/QQQ, LC/QQQ, LC/SQ, HPLC, FTIR Spektroskopie
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Otevřít dokument Agilent 9500 ICP‑QQQ with m‑Lens for Ultratrace Analysis of High‑Purity Reagents
Agilent 9500 ICP‑QQQ with m‑Lens for Ultratrace Analysis of High‑Purity Reagents
ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Otevřít dokument Consumable Solutions for Semiconductor Analysis
Consumable Solutions for Semiconductor Analysis
ICP/MS/MS, ICP/MS
Instrumentace
ICP/MS/MS, ICP/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Otevřít dokument Trace Elemental Analysis of Precursor Materials Using ICP-MS/MS
Trace Elemental Analysis of Precursor Materials Using ICP-MS/MS
ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Otevřít dokument Ultratrace Impurity Analysis of Ultrapure Water with Low Boron Background by ICP-MS/MS
Ultratrace Impurity Analysis of Ultrapure Water with Low Boron Background by ICP-MS/MS
ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Otevřít dokument Determination of Ultratrace Impurities in Semiconductor Photoresist Using ICP-MS/MS
Determination of Ultratrace Impurities in Semiconductor Photoresist Using ICP-MS/MS
ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Otevřít dokument Automated Surface Analysis of Metal Contaminants in Silicon Wafers by Online VPD-ICP-MS/MS
Automated Surface Analysis of Metal Contaminants in Silicon Wafers by Online VPD-ICP-MS/MS
ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Otevřít dokument Direct Analysis of Metallic Impurities in SiC and GaN Wafers by LA-GED-MSAG-ICP-MS/MS
Direct Analysis of Metallic Impurities in SiC and GaN Wafers by LA-GED-MSAG-ICP-MS/MS
ICP/MS, ICP/MS/MS, Laserová ablace
Instrumentace
ICP/MS, ICP/MS/MS, Laserová ablace
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Otevřít dokument WCPS: Particle Analysis of Two High Purity Grades of N-Methyl-2- Pyrrolidone (NMP) using Single Particle (sp)ICP-MS/MS Method
WCPS: Particle Analysis of Two High Purity Grades of N-Methyl-2- Pyrrolidone (NMP) using Single Particle (sp)ICP-MS/MS Method
ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Agilent Technologies
Zaměření
Průmysl a chemie, Polovodiče
Otevřít dokument Analysis of 50 nm Silica Nanoparticles in Semiconductor Process Chemicals by spICP-MS/MS
Analysis of 50 nm Silica Nanoparticles in Semiconductor Process Chemicals by spICP-MS/MS
ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
