Beyond Traditional Ellipsometry: High-Accuracy Thin Film and Multilayer Metrology

Combining Reflectometry and Ellipsometry for High-Accuracy Optical Metrology

This webinar will introduce the principles behind Bruker’s Filmtek spectroscopic reflectometer/ellipsometers and explore how modern optical metrology approaches can overcome many of the limitations associated with conventional single-technique measurements.

Attendees will discover:

• How Filmtek systems independently determine thickness, refractive index (n), and extinction coefficient (k) across a wide range of materials and structures
• How patented DPSD and MADP technologies and complementary optical data help overcome the limits of conventional single-technique measurements
• Why independent determination of thickness and refractive index is essential for complex multilayer stacks and other challenging applications

Webinar Summary

Accurate characterization of thin films and complex multilayer stacks is increasingly critical in semiconductor manufacturing, specifically: photonics, MEMS, advanced packaging, optical coatings, and emerging materials research. This webinar provides an introduction to the unique principles of the Bruker Filmtek spectroscopic reflectometer/ellipsometers, while exploring how modern optical metrology approaches can overcome many of the limitations associated with conventional single-technique measurements.

Attendees will learn how the Filmtek systems combine multi-angle reflectometry and spectroscopic ellipsometry to independently determine film thickness, refractive index (n), and extinction coefficient (k) across a wide range of materials and structures. The presentation will cover the underlying measurement physics, patented Multi-Angle Differential Power Spectral Density (DPSD) and Multi-Angle Differential Polarimetry (MADP) technologies, and the advantages of collecting complementary optical data from the same measurement location.

Real-world application examples will illustrate measurement performance on semiconductor, dielectric, photonic, and multilayer structures ranging from ultra-thin films to complex stacks. Participants will gain practical insight into obtaining accurate thickness and optical constant measurements, improving process control, and addressing challenging applications where independent determination of thickness and refractive index is essential. 

Speaker: Lawrence Rooney (Senior Application Scientist, Bruker)