Ultra‑trace impurity analysis is increasingly required for high‑purity reagents used in semiconductor processing and other advanced materials applications, where chemicals such as nitric and sulfuric acids must meet stringent contamination specifications. Analytical methods for these reagents must achieve sub‑ppt level detection limits (DLs) while maintaining low instrumental backgrounds under hot‑plasma conditions. This study describes a triple quadrupole Inductively Coupled Plasma Mass Spectrometry (ICP QQQ) workflow for the ultra trace analysis of high purity reagents using preset analytical methods optimized for low matrix samples.
Presenter: Bert Woods (Application Scientist, Agilent Technologies, Inc.)
Joined the Agilent ICP-MS team in 2004, with previous employment in the semiconductor industry with Dominion Semiconductor (IBM/Toshiba) and Micron. Bert is a 1997 Chemistry graduate of Radford University in Virginia and an avid Washington DC Sports fan.
