As semiconductor technology proceeds towards nanoscale single crystalline devices, the requirements in material purity and manufacturing accuracy become more grave and demanding. Both semiconductor material R&D and process analytical technology are essential to support the semiconductor line in its advancement.
FT-IR stands out as an easy and effective tool to investigate the fundamentals of semiconductors among other techniques. It is non-destructive, fast and highly sensitive for impurity quantification or failure analysis.
In line with this, Bruker has held a webinar illustrating how FT-IR can assist in R&D or process control by delivering in-depth analysis of semiconductor materials and devices.
Presenter: Dr. Dan Wu (Application Manager at Bruker Optics since over 10 years.)
