ZÁZNAM | Proběhlo Čt, 27.3.2025
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Elimination of Second Surface Reflections in a UV-Vis-nir Reflectance Measurement
Agilent Technologies: Optimize your FTIR, UV-Vis-NIR, Raman, Imaging, and Fluorescence Workflows
Whenever one makes a reflectance measurement of a sample on a substrate or a transparent sample, there is a possibility of the second surface reflection being included in the measurement.
This inclusion into the measurement results in an inaccurate measurement of the sample. There are several ways to eliminate the second surface reflection from being measure and they will be examined in both principle and demonstration during this presentation.
Presenter: Scott Melis, PhD (Application Scientist, Agilent Technologies, Inc.)
Scott Melis has a PHD in Physics from Georgetown University in Washington, DC and started with Agilent in 2021 as a Molecular Spectroscopy Application Scientist. In his graduate work, Scott studied nanoparticle formation and growth for a variety of applications. Projects that he worked with include developing processes to deposit and characterize semiconducting molecular nano-cocrystals for use in optoelectronic devices as well as controlling polymer nanoparticle size through rapid mixing conditions.
