Aplikace z oblasti Polovodiče od Agilent Technologies - strana 3

Otevřít dokument Direct Analysis of Metallic Impurities in SiC and GaN Wafers by LA-GED-MSAG-ICP-MS/MS
ICPMS

Direct Analysis of Metallic Impurities in SiC and GaN Wafers by LA-GED-MSAG-ICP-MS/MS

ICP/MS, ICP/MS/MS, Laserová ablace
Instrumentace
ICP/MS, ICP/MS/MS, Laserová ablace
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Otevřít dokument Automated Surface Analysis of Metal Contaminants in Silicon Wafers by Online VPD-ICP-MS/MS
ICPMS

Automated Surface Analysis of Metal Contaminants in Silicon Wafers by Online VPD-ICP-MS/MS

ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Otevřít dokument Determination of Ultratrace Impurities in Semiconductor Photoresist Using ICP-MS/MS
ICPMS

Determination of Ultratrace Impurities in Semiconductor Photoresist Using ICP-MS/MS

ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Otevřít dokument Agilent ICP-MS Journal (November 2022, Issue 90)
ICPMS

Agilent ICP-MS Journal (November 2022, Issue 90)

ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Agilent Technologies
Zaměření
Průmysl a chemie, Farmaceutická analýza, Polovodiče
Otevřít dokument Automated Analysis of Ultratrace Elemental Impurities in Isopropyl Alcohol
ICPMS

Automated Analysis of Ultratrace Elemental Impurities in Isopropyl Alcohol

ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Otevřít dokument Elemental and Particle Analysis of N-Methyl-2-Pyrrolidone (NMP) by ICP-MS/MS
ICPMS

Elemental and Particle Analysis of N-Methyl-2-Pyrrolidone (NMP) by ICP-MS/MS

ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Otevřít dokument Characterization of Iron Nanoparticles in Hydrocarbon Matrices by Single Particle (sp)ICP-MS
ICPMS

Characterization of Iron Nanoparticles in Hydrocarbon Matrices by Single Particle (sp)ICP-MS

ICP/MS
Instrumentace
ICP/MS
Výrobce
Agilent Technologies
Zaměření
Průmysl a chemie, Polovodiče
Otevřít dokument Analysis of Metallic Impurities in Specialty Semiconductor Gases Using Gas Exchange Device (GED)-ICP-MS
ICPMS

Analysis of Metallic Impurities in Specialty Semiconductor Gases Using Gas Exchange Device (GED)-ICP-MS

ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Otevřít dokument Trace Elemental Analysis of Trichlorosilane by Agilent ICP-MS
ICPMS

Trace Elemental Analysis of Trichlorosilane by Agilent ICP-MS

ICP/MS
Instrumentace
ICP/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Otevřít dokument Analysis of Ultratrace Impurities in High Silicon Matrix Samples by ICP-QQQ
ICPMS

Analysis of Ultratrace Impurities in High Silicon Matrix Samples by ICP-QQQ

ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče